Legend of the Planet Builder-Chapter 102 - s 102 103 EVU Alliance (Additional update
Chapter 102 -s 102, 103 EVU Alliance (Additional update for Gè Hūnxiǎo and subscribers)
Chapter 102 -s 102, 103 EVU Alliance (Additional update for Gè Hūnxiǎo and subscribers)
“Furukawa, what’s happening?” Everyone looked at him with confusion.
Furukawa Taizhi said, “Just now, Shen Zhou Science Academy announced that they have made a breakthrough in the production technology of Extreme Ultraviolet Lithography photoresist. They are going to start mass manufacturing high-end photoresists!”
“What?” Representatives from several major conglomerates abruptly stood up, “This is no laughing matter!”
“I’m not joking!” Furukawa Taizhi continued, “Several photoresist companies in Shen Zhou declared that they have obtained technology licensing and will immediately construct factories to begin production!”
Seeing his anxious tone, which did not seem deceitful, everyone quickly started checking the information.
Soon, they saw the news report.
“Is the news confirmed to be true?” A representative from Tokyo Applied Group made a call to inquire with the president of their Shen Zhou region.
“It’s true. We have already made contact, and they even specially demonstrated samples and related data!” The other side replied.
“How could it be so fast?” Representatives of the Sakura Photoresist Company looked at each other with dismay in the meeting room. It had only been a month since they stopped supplying, right?
A month, and their technical advantage and product monopoly were gone?
Even Aoki Daikichi was taken aback. If this was true, wouldn’t they have shot themselves in the foot?
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They had just exited Shen Zhou’s market, and now Shen Zhou had its own high-end photoresist. Weren’t they just giving away their market share for nothing? Is there anything so foolish in the world?
“Damn it!” A representative from JSR cursed, “This is a market worth tens of billions of US Dollars a year. To hand it over because of a stupid agreement?”
Aoki Daikichi also didn’t dare to speak recklessly. The energy of these multinational corporations was not small; he could only say guiltily, “Maybe they had already made the breakthrough and are only announcing it now.”
“No!” Furukawa Taizhi said angrily, “It is entirely because of your foolish agreement!”
“I’ve heard that because of this, Shen Zhou mobilized national experts and united tens of thousands of companies to jointly develop, which is why the progress was so fast! Under normal circumstances, it would be impossible for them to break through Extreme Ultraviolet photoresist technology this quickly!”
Hearing Furukawa Taizhi’s words, other representatives looked angrily at Mr. Aoki. It took them decades to compete with American companies and to finally establish a leading international position for photoresists. They hadn’t expected to be surpassed within a month!
All this was caused by that so-called “Comprehensive Cooperation” agreement!
“Mr. Aoki, we need an explanation!” A representative from JSR said.
“Our loss is caused by the managers of Japan! They must present a solution!” A representative from Tokyo Applied Group exclaimed.
“Our group will issue a letter of protest!” said a representative from Fuji Photo Film coldly—their protest wasn’t about taking to the streets but was a higher-stakes political game.
These large capitals had countless ties to the management of Sakura Island. Aoki Daikichi felt cold sweat on his back; he knew that his faction had now offended a large capital group!
Someone would have to take the blame to appease their rage, and he might very well become the scapegoat!
“Why, it’s only been a month!” Aoki Daikichi was screaming inside. If the breakthrough had come just a few months later, Shen Zhou would definitely have made concessions. But why so fast?
…
The breakthrough in Extreme Ultraviolet photoresist signified that the most crucial material issue for lithography machines and chip manufacturing had been resolved.
At the same time, Lu Jianye’s team had perfected the “lenses” required for the Extreme Ultraviolet Lithography Machine. Previously, these were products you couldn’t even buy with money; only Hans’s Zeiss Company could make them. Now, Shen Zhou could manufacture them on their own.
Other high-end components were also being manufactured in sync.
In terms of chip design, it was relatively simpler. Shen Zhou was already able to design high-precision chips; they just couldn’t manufacture them. With He Xingzhou’s minor improvements, the design for the 3 nanometer process chips was completed.
Now, the only thing standing in the way of manufacturing the Extreme Ultraviolet Lithography Machine and producing the 3 nanometer process chips was the final problem — the Extreme Ultraviolet “light blade”.
He Xingzhou arrived at the Photoelectric Research Institute to research together with the team led by Academician Yan Rui.
Inside the laser research room, Yan Rui was explaining their encountered problems: “Currently, our method involves using a laser to bombard target material with a gas jet to generate plasma, which then emits EUV radiation. The EUV radiation, after going through the focusing system composed of periodic multilayer thin-film reflective mirrors, strikes the reflective mask. The emitted EUV lightwave then projects the geometric patterns of the integrated circuit from the reflective mask onto the photoresist on the silicon wafer, thereby forming the photolithography pattern required for integrated circuits.”
“Theoretically, there is no problem with this process,” He Xingzhou nodded in agreement.
“But the problem lies in how to increase the EUV light source power while reducing particles, high-speed particles, and other contaminants in the plasma atmosphere,” Yan Rui said, troubled, “otherwise the light source will rapidly deteriorate. Moreover, extreme ultraviolet projection lithography uses a reflective mask system.”
“Our EUV mask defects are still at ldefect/cm², and the manufacturing level of the inspection machines also needs to be further improved.”
“The issue with the inspection machines, I believe Professor Lu’s team should be able to solve,” said He Xingzhou, “As for the Extreme Ultraviolet light source problem, I have thought of a solution.”
“What’s the solution?” All the academicians and experts looked at him.
“Enhancement of the light source power can be achieved with electrical power!” He Xingzhou said.
“After the plasma body is heated by the high-power laser and reflected multiple times, an Extreme Ultraviolet light source is formed. At this moment, design a discharge reaction chamber, allowing the plasma to further transform, emitting brighter, purer Extreme Ultraviolet light. If there are additional multilayer reflective mirrors, the nanoscale precision of EUV will be further enhanced, possibly meeting the requirements for the 3 nanometer process!”
